Senntech SI-591 RIE
DESCRIPTION
Plasma Etcher
Materials: Cr, Diamond, Si, Ge, Mo, CaF, C
Sample size: max 8" Wafer or 6” mask, min chip size 10x10 mm
Plasma Etcher
Materials: Cr, Diamond, Si, Ge, Mo, CaF, C
Sample size: max 8" Wafer or 6” mask, min chip size 10x10 mm