Oxford OpAL Atomic Layer Deposition
DESCRIPTION
Thermal and Plasma-Enhanced Atomic Layer Deposition
Al2O3 (thermal + plasma), TiO2 (thermal + plasma), SiO2 (thermal)
max sample size 6” mask blank
max layer thickness 200 nm
Thermal and Plasma-Enhanced Atomic Layer Deposition
Al2O3 (thermal + plasma), TiO2 (thermal + plasma), SiO2 (thermal)
max sample size 6” mask blank
max layer thickness 200 nm