Wet bench
DESCRIPTION
wet bench for structuring, cleaning and developing samples wet etching for Au, Cr and Al
Caro’s acid, organic solvents, ultrasonic (35 kHz), megasonic (1 MHz) for sample cleaning
developing of photo resist and e-beam resists
wet bench for structuring, cleaning and developing samples wet etching for Au, Cr and Al
Caro’s acid, organic solvents, ultrasonic (35 kHz), megasonic (1 MHz) for sample cleaning
developing of photo resist and e-beam resists