Suitable for all typical spin processes: cleaning, rinse/dry, coating, developing and etching. The SPIN150i spin coater is suitable for processing fragments as small as 5 mm up to Ø150 (or 6”) or 4″ x 4″ substrates. Detachable touchpanel. Unlimited Program Storage for recipes with multiple steps each (CW & CCW rotation for puddle spin coating applications.) up to 6’’ wafers or 4’’ x 4’’ substrates 12 k rpm, programmable speed and acceleration profiles