Nanoscribe Quantum X Align

Nanoscribe Quantum X Align

DESCRIPTION

3D Laser Lithography

– Aligned 2-Photon Lithography : Enables automatically aligned 3D printing on microchips and optical fibers with nanoscale precision

– Two-Photon Grayscale Lithography: up to 60 times faster than traditional 2PP

– Alignment Accuracy: < 100 nm in X/Y and < 500 nm in Z.

– Feature Size Control: Down to ~100 nm

– Surface Quality: Surface roughness < 5 nm; shape accuracy ~200 nm

– Substrate Compatibility: diverse material platforms such as SiN, Si, SOI, GaAs, and LNOI across slide sizes up to 8-inch wafers

PROVIDER
AFFILIATED ORGANIZATIONS
Friedrich-Schiller-Universität Jena