Oxford Instruments PlasmaPro 100 Cobra
DESCRIPTION
Plasma Etcher
Plasma: ICP 1500W, HF for RIE: 500W, BIAS max 250V
Gases: BCL3, Cl2, SF6, CF4, CHF3, O2, Ar, N2,
He-Backside cooling
Sample size: max 4" Wafer or 80 mm round in 4" Si Dummy, loadlock
Plasma Etcher
Plasma: ICP 1500W, HF for RIE: 500W, BIAS max 250V
Gases: BCL3, Cl2, SF6, CF4, CHF3, O2, Ar, N2,
He-Backside cooling
Sample size: max 4" Wafer or 80 mm round in 4" Si Dummy, loadlock