Electron-beam evaporation system for thin-film deposition

• Electron-beam evaporation system for metallic and dielectric thin films

• Automated recipe-based process control (Temescal Control System)

• High-vacuum deposition chamber (up to 10⁻⁸ Torr)

• Integrated deposition monitoring and data logging

• Cryopump-based vacuum system

• Contamination-controlled chamber design

• Suitable for photonics, nanotechnology, and microelectronics applications