FEI Helios Nanolab 660/G3UC

FEI Helios Nanolab 660/G3UC

DESCRIPTION

Cross beam FIB/SEM system

Suitable for samples with 100mm diameter maximum

SEM inspection & FIB cross-sectioning

  • field emission SEM (0.8 pA – 100 nA; 20 eV – 30 keV; 0.54 nm)

  • gallium focused ion beam (1.1 pA – 65 nA; 0.5 – 30 keV; 3.7 nm)

  • SE, SI, BSE, and STEM detector

  • charge compensation

  • 4 single GIS systems (Pt, C, F)

  • 4 axes micro-manipulator

  • automated slicing for 3D reconstruction

  • ion and electron beam lithography

PROVIDER
AFFILIATED ORGANIZATIONS
Friedrich-Schiller-Universität Jena