FEI Helios Nanolab 660/G3UC
DESCRIPTION
Cross beam FIB/SEM system
Suitable for samples with 100mm diameter maximum
SEM inspection & FIB cross-sectioning
field emission SEM (0.8 pA – 100 nA; 20 eV – 30 keV; 0.54 nm)
gallium focused ion beam (1.1 pA – 65 nA; 0.5 – 30 keV; 3.7 nm)
SE, SI, BSE, and STEM detector
charge compensation
4 single GIS systems (Pt, C, F)
4 axes micro-manipulator
automated slicing for 3D reconstruction
ion and electron beam lithography