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Electron Beam Lithography
Raith E-line Plus (Nano-Technology)
Raith E-line Plus
DESCRIPTION
moving beam EBL tool with maximum 30kV acceleration voltage
PROVIDER
ACCESS
Only used for EBL
CONTACTS
Oliver Rüger (oliver.rueger@uni-jena.de)
AFFILIATED ORGANIZATIONS
Friedrich-Schiller-Universität Jena
ADD-ONS